π FinFETs are a new type of device that attracted a lot of attention.
βοΈ FinFET technology has complex issues associated with it, such as processing variability and time-dependent variability.
π¬ There is a benchmark between bulk devices and SOI-based devices to compare their differences and potential.
π FinFETs are a type of transistor that have a vertical channel and gates around the channel, creating conceptual problems for designers.
π§ There are two flavors of FinFETs: bulk FinFETs, adopted by major providers, and FinFETs on SOI substrate, which have better control over transistor dimensions but may have self-heating effects.
π‘ FinFETs offer a more complicated operation compared to planar transistors, and their variability poses challenges for scaling SRAM in small devices.
π FinFETs are a type of transistor that have a different charge distribution compared to depleted transistors.
π‘ Current flow in FinFETs is non-uniform, with most of the current flowing in the middle at threshold voltage and through the corners at high gate voltage.
π FinFETs have better suppression swap in both transistors, resulting in lower subthreshold swap and potential advantages in terms of leakage and performance.
π FinFETs introduce additional capacitances due to vertical fin geometry and overgrown source and drain regions, resulting in complex capacitance variations.
ποΈ FinFET fabrication is more complex and involves vertical etching and epitaxial growth, leading to variations in fin shape and contact resistance.
π¬ Device simulation of FinFETs is challenging due to their complex geometry, including triangular or trapezoidal structures and quantum confinement effects.
β‘ Triangular FinFET geometry may have reliability issues and suboptimal performance compared to vertical FinFETs.
π FinFETs are difficult to fabricate uniformly and their performance is affected by variations in shape.
π‘ Compared to rectangular transistors, FinFETs have lower performance by 10 to 12 percent.
π¬ A case study comparing bulk and SOI transistors showed that SOI FinFETs had higher performance and lower leakage current.
π It is important to consider process variability and control different aspects of the device geometry in FinFET design.
π There is a strong correlation between statistical and process variability in FinFETs, which affects device performance.
π¬ Compact models can accurately capture process variation and help analyze the impact on circuit design, such as SRAM.
π Monte Carlo simulation can be used to predict the performance and behavior of FinFETs, allowing for more complex analysis of SRAM designs.
π Good compact models combined with statistical variability can show the interplay between process and statistical variability, helping to understand the impact on SRAM design.
βοΈ Simulation is crucial in predicting future technology and estimating the impact of different devices and degradation on SRAM cell designs.
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